描述
無描述配置
Wafer Size: 4". 6". 8" (4" is reformed) Auto Wafer Thickness Compensator (0.2 to 4.0mm) Robotic Wafer Handler PATMAX MVS Alignment System Dual Flip Aperture, 2,3 and 4 field ghi-line Automatic Filter Changer 1200 W Illuminator environmental chamberOEM 代工型號說明
The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities.文檔
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VEECO / ULTRATECH
SATURN SPECTRUM 3e
已驗證
類別
Photolithography
上次驗證: 2 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
84432
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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VEECO / ULTRATECH
SATURN SPECTRUM 3e
類別
Photolithography
上次驗證: 2 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
84432
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm
年份:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Wafer Size: 4". 6". 8" (4" is reformed) Auto Wafer Thickness Compensator (0.2 to 4.0mm) Robotic Wafer Handler PATMAX MVS Alignment System Dual Flip Aperture, 2,3 and 4 field ghi-line Automatic Filter Changer 1200 W Illuminator environmental chamberOEM 代工型號說明
The Ultratech Saturn Spectrum 3e is a lithography stepper from Ultratech Stepper Inc. that is designed for high-volume flip-chip (bump) and wafer-level packaging manufacturing. It features an improved machine vision system (MVS) with the addition of the PatMAX architecture, which is a pattern recognition-based alignment system that eliminates the need for dedicated targets and simplifies integration with existing processes. The Saturn Spectrum 3e also has improved illumination, providing an increased wafer plane irradiance of 1900 mW/cm2, resulting in decreased exposure times and improved productivity. Additionally, the tool incorporates an automated field aperture changer to enable faster reticle field size changes, as well as an automated broadband ghi-line filter changer, allowing automated switching between either g, h or i-line exposure capabilities.文檔
無文檔