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ULVAC CC-400
  • ULVAC CC-400
  • ULVAC CC-400
  • ULVAC CC-400
  • ULVAC CC-400
描述
無描述
配置
無配置
OEM 代工型號說明
The CC-400 is a load-lock-type plasma CVD system that is part of the CC-Series (CC-200/400). It is a compact and easy-to-use system designed for both R&D and production. The system supports high-density plasma processes on 27.12MHz and can deposit SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). It also supports chamber cleaning by CF4+O2 plasma, heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-400 has special features and further applications in compound-related devices of LED, LD, high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.
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已驗證

類別
PECVD

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

104157


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
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Refurbishment Services
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ULVAC

CC-400

verified-listing-icon
已驗證
類別
PECVD
上次驗證: 超過60天前
listing-photo-8c45321c12034b05ac7a1451084c5ce9-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/8c45321c12034b05ac7a1451084c5ce9/2f5d1cc0916940a58eabec59c37f16ea_1_mw.jpg
listing-photo-8c45321c12034b05ac7a1451084c5ce9-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/8c45321c12034b05ac7a1451084c5ce9/2719d84118254ac889ce9fc2d5c122e6_3_mw.jpg
listing-photo-8c45321c12034b05ac7a1451084c5ce9-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/8c45321c12034b05ac7a1451084c5ce9/f5cb310917fb401f86c401db5c75584c_2_mw.jpg
listing-photo-8c45321c12034b05ac7a1451084c5ce9-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/75657/8c45321c12034b05ac7a1451084c5ce9/290245e877f345f5a075c6c15d3de8d9_4_mw.jpg
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

104157


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
無配置
OEM 代工型號說明
The CC-400 is a load-lock-type plasma CVD system that is part of the CC-Series (CC-200/400). It is a compact and easy-to-use system designed for both R&D and production. The system supports high-density plasma processes on 27.12MHz and can deposit SiH4 (SiO2, SiNx, SiON, a-Si) and TEOS (SiO2). It also supports chamber cleaning by CF4+O2 plasma, heater for low-temperature deposition of organic EL, and various substrate sizes. The CC-400 has special features and further applications in compound-related devices of LED, LD, high-speed devices, organic EL systems for R&D use, solar battery systems for R&D use, and MEMS.
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無文檔