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PLASMATHERM LAPECVD
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
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    PLASMATHERM

    LAPECVD

    verified-listing-icon

    已驗證

    類別
    PECVD

    上次驗證: 8 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    114751


    晶圓尺寸:

    未知


    年份:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
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    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD
    年份: 2009條件: 二手
    上次驗證超過60天前

    PLASMATHERM

    LAPECVD

    verified-listing-icon
    已驗證
    類別
    PECVD
    上次驗證: 8 天前
    listing-photo-7a6787c3d8ad406889461cc466aaf415-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    114751


    晶圓尺寸:

    未知


    年份:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    文檔

    無文檔

    類似上架商品
    查看全部
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD年份: 2009條件: 二手上次驗證:超過60天前
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD年份: 2006條件: 二手上次驗證:8 天前