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OXFORD PLASMALAB 800 PLUS
    描述
    Reactive Ion Etching Machine Frequency: 50/60HZ Voltage: 415VAC 3PHASE Full Load Amps:25.6Amps Machine Main Breaker Rating:32Amps Ampere Rating Of Largest Load:20Amps Interupt Current:4500 A.I.C Configuration: Nitride and Oxide Deposition Batch process tool, 18" platen  RF Components: ENI:  ACG - 5 XL , RF generator, 13.56MHZ, 500W ENI:  LPG - 6A , RF generator, 90kHz to 460kHz, 600W ATX-600 impedence matching network 450mm Platen with 300°C+ heater Windows PC , user friendly interface Gas pod with 6 lines including following MFCs: N2 – 1000sccm N2O – 100sccm N2O – 2000sccm NH3 – 100sccm SiH4 – 2000sccm  Gases Previously Used were the Following:  N2O , N2, NH3, SiH4  The tool is compact and very simple for operation. Footprint is 36"W x 42"D x 54" H. The chamber is on the top. The power supply, etc. are in the front and accessible behind a stainless steel panel. There is no load lock. You open the chamber, load one or more 4" substrates, close the chamber, and start the chamber pump down. Once the desired vacuum level is achieved, It is ready to run deposition process.
    配置
    Reactive Ion Etching Machine
    OEM 代工型號說明
    The PlasmaPro 800Plus is a plasma etch and deposition solution that offers a large area for processing. It features an open loading design, making it easy to use and convenient to site, all while maintaining a compact footprint. The system is capable of handling full 300mm wafers or large batches of 43 x 50mm (2”) wafers, thanks to its 380mm or 460mm diameter table. This makes the PlasmaPro 800Plus a well-proven market-leading product that offers full production solutions without compromising on process quality.
    文檔
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    已驗證

    類別
    PECVD

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Idle


    產品編號:

    131557


    晶圓尺寸:

    未知


    年份:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    OXFORD PLASMALAB 800 PLUS

    OXFORD

    PLASMALAB 800 PLUS

    PECVD
    年份: 0條件: 二手
    上次驗證超過30天前

    OXFORD

    PLASMALAB 800 PLUS

    verified-listing-icon
    已驗證
    類別
    PECVD
    上次驗證: 超過60天前
    listing-photo-599564fdc23e45339a0e944218345ba7-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/89425/131557/8e7eaabe40ff4fe9ab51d973e93bbcbb_c4080b1ce57848f2bb4408d05b25863519_mw.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Idle


    產品編號:

    131557


    晶圓尺寸:

    未知


    年份:

    2007


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Reactive Ion Etching Machine Frequency: 50/60HZ Voltage: 415VAC 3PHASE Full Load Amps:25.6Amps Machine Main Breaker Rating:32Amps Ampere Rating Of Largest Load:20Amps Interupt Current:4500 A.I.C Configuration: Nitride and Oxide Deposition Batch process tool, 18" platen  RF Components: ENI:  ACG - 5 XL , RF generator, 13.56MHZ, 500W ENI:  LPG - 6A , RF generator, 90kHz to 460kHz, 600W ATX-600 impedence matching network 450mm Platen with 300°C+ heater Windows PC , user friendly interface Gas pod with 6 lines including following MFCs: N2 – 1000sccm N2O – 100sccm N2O – 2000sccm NH3 – 100sccm SiH4 – 2000sccm  Gases Previously Used were the Following:  N2O , N2, NH3, SiH4  The tool is compact and very simple for operation. Footprint is 36"W x 42"D x 54" H. The chamber is on the top. The power supply, etc. are in the front and accessible behind a stainless steel panel. There is no load lock. You open the chamber, load one or more 4" substrates, close the chamber, and start the chamber pump down. Once the desired vacuum level is achieved, It is ready to run deposition process.
    配置
    Reactive Ion Etching Machine
    OEM 代工型號說明
    The PlasmaPro 800Plus is a plasma etch and deposition solution that offers a large area for processing. It features an open loading design, making it easy to use and convenient to site, all while maintaining a compact footprint. The system is capable of handling full 300mm wafers or large batches of 43 x 50mm (2”) wafers, thanks to its 380mm or 460mm diameter table. This makes the PlasmaPro 800Plus a well-proven market-leading product that offers full production solutions without compromising on process quality.
    文檔
    類似上架商品
    查看全部
    OXFORD PLASMALAB 800 PLUS

    OXFORD

    PLASMALAB 800 PLUS

    PECVD年份: 0條件: 二手上次驗證:超過30天前
    OXFORD PLASMALAB 800 PLUS

    OXFORD

    PLASMALAB 800 PLUS

    PECVD年份: 1998條件: 二手上次驗證:超過60天前
    OXFORD PLASMALAB 800 PLUS

    OXFORD

    PLASMALAB 800 PLUS

    PECVD年份: 2011條件: 二手上次驗證:超過30天前