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描述
Overhaul done System Condition : working state (dismantled and packed)配置
Gas supply (PECVD) . MFC_MKS 1479A --- corrosive gas: 5%SiH4/N2, NH3 . MFC_MKS 1179A --- non-corrosive gas: CF4, N2, N2O Gas supply (ICP-RIE) . MFC_MKS 1479A --- corrosive gas: Cl2, BCl3 , HBr (SiCl4) . MFC_MKS 1179A --- non-corrosive gas: O2, Ar, SF6 . 415V Heated Gas Kit --- required as SiCl4, BCl3, C4F8OEM 代工型號說明
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces文檔
類別
PECVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
112074
晶圓尺寸:
6"/150mm, 8"/200mm
年份:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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OXFORD
PLASMALAB 100
類別
PECVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
112074
晶圓尺寸:
6"/150mm, 8"/200mm
年份:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available