描述
APPLIED MATERIALS AMAT AKT 25 K GEN 6 PECVD CHAMBER ONLY配置
Chambers were never commisioned and remain in “new” unused condition. Sold “AS IS” Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: ASTRON HF+, AX7636-04OEM 代工型號說明
AKT-25K PECVD(1,500mm x 1,850mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers文檔
無文檔
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
25K PECVD
已驗證
類別
PECVD
上次驗證: 20 天前
關鍵商品詳情
條件:
Parts Tool
作業狀態:
Deinstalled
產品編號:
113545
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
25K PECVD
類別
PECVD
上次驗證: 20 天前
關鍵商品詳情
條件:
Parts Tool
作業狀態:
Deinstalled
產品編號:
113545
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
APPLIED MATERIALS AMAT AKT 25 K GEN 6 PECVD CHAMBER ONLY配置
Chambers were never commisioned and remain in “new” unused condition. Sold “AS IS” Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: ASTRON HF+, AX7636-04OEM 代工型號說明
AKT-25K PECVD(1,500mm x 1,850mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers文檔
無文檔