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描述
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”配置
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEM 代工型號說明
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers文檔
無文檔
類別
PECVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Parts Tool
作業狀態:
未知
產品編號:
113547
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / APPLIED KOMATSU TECH (AKT)
15K PECVD
類別
PECVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Parts Tool
作業狀態:
未知
產品編號:
113547
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
APPLIED MATERIALS AKT 15 K GEN 5 PECVD CHAMBER ONLY. These chambers were never commissioned and remain in “new” unused condtion. Chambers being sold “AS IS”配置
Substrate Size: 1200 mm x 1300 mm MKS ASTeX Remote Plasma Source, Model: ASTRON e/exOEM 代工型號說明
AKT-15K PECVD(1,200mm x 1,300mm) PECVD systems deposit doped and undopedamorphous silicon, silicon nitride, silicon oxide and oxynitride PECVD systems deposit films on glass substrates more than 70 times larger than 300mm wafers文檔
無文檔