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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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KLA ARCHER AIM+
    描述
    Overlaying instrument No missing parts Current Wafer size : 12
    配置
    無配置
    OEM 代工型號說明
    The Archer AIM+ is an advanced optical overlay metrology tool that sets the standard for lithography process control through the > 45-nm node. It improves yield and cost of ownership with a 20% increase in throughput over previous-generation solutions. It features field-proven AIM grating-style technology, improved optics design, and high accuracy measurements. Its applications include overlay metrology, CMP, lithography, and wafer surface focus and analysis.
    文檔

    無文檔

    KLA

    ARCHER AIM+

    verified-listing-icon

    已驗證

    類別
    Overlay

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Deinstalled


    產品編號:

    107071


    晶圓尺寸:

    8"/200mm, 12"/300mm


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    KLA ARCHER AIM+

    KLA

    ARCHER AIM+

    Overlay
    年份: 0條件: 二手
    上次驗證超過60天前

    KLA

    ARCHER AIM+

    verified-listing-icon
    已驗證
    類別
    Overlay
    上次驗證: 超過60天前
    listing-photo-f723394a3c9b4584b2a839f71b137060-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Deinstalled


    產品編號:

    107071


    晶圓尺寸:

    8"/200mm, 12"/300mm


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Overlaying instrument No missing parts Current Wafer size : 12
    配置
    無配置
    OEM 代工型號說明
    The Archer AIM+ is an advanced optical overlay metrology tool that sets the standard for lithography process control through the > 45-nm node. It improves yield and cost of ownership with a 20% increase in throughput over previous-generation solutions. It features field-proven AIM grating-style technology, improved optics design, and high accuracy measurements. Its applications include overlay metrology, CMP, lithography, and wafer surface focus and analysis.
    文檔

    無文檔

    類似上架商品
    查看全部
    KLA ARCHER AIM+

    KLA

    ARCHER AIM+

    Overlay年份: 0條件: 二手上次驗證:超過60天前
    KLA ARCHER AIM+

    KLA

    ARCHER AIM+

    Overlay年份: 0條件: 翻新的上次驗證:超過60天前
    KLA ARCHER AIM+

    KLA

    ARCHER AIM+

    Overlay年份: 0條件: 翻新的上次驗證:超過60天前