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KLA ARCHER AIM
  • KLA ARCHER AIM
  • KLA ARCHER AIM
  • KLA ARCHER AIM
描述
無描述
配置
無配置
OEM 代工型號說明
Archer AIM is an Advanced Optical Overlay Metrology product that improves stepper correction accuracy, provides precise data, and enables design rule segmentation. It delivers industry-leading precision performance, reduces total measurement uncertainty, and increases sampling rate. It also includes offline automatic recipe creation and real-time analysis software. The MPX option enables ‘on product’ monitoring of focus-exposure. Archer AIM targets new standards for lithography process control for 65-nm and beyond, reducing measurement uncertainty and enabling control of overlay error budgets. It integrates with KLA-Tencor’s software management products to provide comprehensive optical overlay metrology process control.
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verified-listing-icon

已驗證

類別
Overlay

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

49248


晶圓尺寸:

12"/300mm


年份:

2003


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

ARCHER AIM

verified-listing-icon
已驗證
類別
Overlay
上次驗證: 超過60天前
listing-photo-43625f203abe414686d7b2005cb2411c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

49248


晶圓尺寸:

12"/300mm


年份:

2003


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
無配置
OEM 代工型號說明
Archer AIM is an Advanced Optical Overlay Metrology product that improves stepper correction accuracy, provides precise data, and enables design rule segmentation. It delivers industry-leading precision performance, reduces total measurement uncertainty, and increases sampling rate. It also includes offline automatic recipe creation and real-time analysis software. The MPX option enables ‘on product’ monitoring of focus-exposure. Archer AIM targets new standards for lithography process control for 65-nm and beyond, reducing measurement uncertainty and enabling control of overlay error budgets. It integrates with KLA-Tencor’s software management products to provide comprehensive optical overlay metrology process control.
文檔

無文檔