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KLA ARCHER 300
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    無描述
    配置
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    OEM 代工型號說明
    The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.
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    已驗證

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    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    133292


    晶圓尺寸:

    12"/300mm


    年份:

    2012


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
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    KLA ARCHER 300

    KLA

    ARCHER 300

    Overlay
    年份: 0條件: 二手
    上次驗證超過60天前

    KLA

    ARCHER 300

    verified-listing-icon
    已驗證
    類別
    Overlay
    上次驗證: 超過60天前
    listing-photo-f8555bd667294f7bb2cd8901af5adb6d-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    133292


    晶圓尺寸:

    12"/300mm


    年份:

    2012


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The Archer 300 LCM is a high-performance, low-cost metrology system for 2Xnm logic and 1Xnm half-pitch memory devices. It offers precision, fast measurement speed, and in-field metrology capability. Improvements to the imaging-based optical subsystem result in better overlay measurement specifications than the previous-generation Archer 200. The system provides cost-effective characterization of overlay error and CD on lithography process layers for double patterning and other advanced technologies. It is also seamlessly integrated with K-T Analyzer, an advanced data analysis system, and Recipe Database Manager (RDM), a centralized database of production-proven recipe components. The Archer 300 LCM is suitable for double patterning technologies, scanner qualification, and in-line monitoring.
    文檔

    無文檔

    類似上架商品
    查看全部
    KLA ARCHER 300

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    Overlay年份: 0條件: 二手上次驗證:超過60天前
    KLA ARCHER 300

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    Overlay年份: 0條件: 二手上次驗證:2 天前
    KLA ARCHER 300

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    ARCHER 300

    Overlay年份: 0條件: 二手上次驗證:29 天前