Lam Research is a leading supplier of plasma etch- and single-wafer clean equipment that plays a pivotal role in defining the features and capabilities of next-generation semiconductor devices. With the addition of Novellus' innovative thin-film deposition and surface preparation product lines, the new Lam Research is well-positioned within the industry to support critical technology transitions including 3D structures in advanced logic and NAND memory, as well as the scaling to 450 mm wafers.

LAM RESEARCH / NOVELLUS

Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.

CONCEPT TWO "C2" ALTUS

LAM RESEARCH / NOVELLUS

CONCEPT TWO "C2" ALTUS

CVD

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LAM RESEARCH / NOVELLUS

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LAM RESEARCH / NOVELLUS

CONCEPT TWO "C2" ALTUS

LAM RESEARCH / NOVELLUS

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LAM RESEARCH / NOVELLUS

CONCEPT TWO "C2" ALTUS

CONCEPT TWO "C2" ALTUS

CVD

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LAM RESEARCH / NOVELLUS

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LAM RESEARCH / NOVELLUS

CONCEPT TWO "C2" ALTUS

LAM RESEARCH / NOVELLUS

CONCEPT TWO "C2" ALTUS

LAM RESEARCH / NOVELLUS

CONCEPT TWO "C2" ALTUS