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AIXTRON AIX G5
  • AIXTRON AIX G5
  • AIXTRON AIX G5
  • AIXTRON AIX G5
描述
無描述
配置
- 8X6 Configuration - Heated exhaust from chamber to filter assembly - Dual filter assembly Inverted and Phoniex filter - VAT Throttle Valve - Extra Pressure sensors for both exhaust streams (Hydride and CL2) - Internal scrubber switching - EPITT Version 2 - EPISON on Dopant MO line plus heating from bubbler to Run/Vent line - Ebara ESA100WN process pump - Two Triscroll pumps: for glovebox and Antechamber - Aixact version 7.6..2.1 - Process module 208VAC, RF Generator 480VAC - No transfer modules
OEM 代工型號說明
The G5 series reactors typically feature AIXTRON's Planetary Reactor technology, which allows for high-quality, uniform growth of films. This is achieved by rotating the substrate wafers around a central point, similar to the planets orbiting the sun, while gases are injected into the chamber.
文檔

無文檔

verified-listing-icon

已驗證

類別
MOCVD

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

117155


晶圓尺寸:

未知


年份:

2014


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AIXTRON

AIX G5

verified-listing-icon
已驗證
類別
MOCVD
上次驗證: 超過60天前
listing-photo-94a2f69a5de8400d9db9148e1ddc49a1-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

117155


晶圓尺寸:

未知


年份:

2014


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
- 8X6 Configuration - Heated exhaust from chamber to filter assembly - Dual filter assembly Inverted and Phoniex filter - VAT Throttle Valve - Extra Pressure sensors for both exhaust streams (Hydride and CL2) - Internal scrubber switching - EPITT Version 2 - EPISON on Dopant MO line plus heating from bubbler to Run/Vent line - Ebara ESA100WN process pump - Two Triscroll pumps: for glovebox and Antechamber - Aixact version 7.6..2.1 - Process module 208VAC, RF Generator 480VAC - No transfer modules
OEM 代工型號說明
The G5 series reactors typically feature AIXTRON's Planetary Reactor technology, which allows for high-quality, uniform growth of films. This is achieved by rotating the substrate wafers around a central point, similar to the planets orbiting the sun, while gases are injected into the chamber.
文檔

無文檔