描述
Automatic CV System for CV/QV/IV measurement配置
無配置OEM 代工型號說明
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.文檔
無文檔
SSM
5200
已驗證
類別
Metrology
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
115106
晶圓尺寸:
8"/200mm
年份:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SSM
5200
類別
Metrology
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
115106
晶圓尺寸:
8"/200mm
年份:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Automatic CV System for CV/QV/IV measurement配置
無配置OEM 代工型號說明
The SSM 5200 is an off-line metrology system that measures a variety of electrical oxide and dielectric characteristics on monitor wafers. It can measure capacitive effective thickness and equivalent oxide thickness of advanced gate dielectrics less than 1 nanometer thick with high precision. It also includes a wide range of current voltage (IV) measurements such as leakage current, TDDB, and SILC. The SSM 5200 uses a small elastic probe to form a temporary gate on the dielectric surface and an integrated pattern recognition system to locate scribe line test areas. The elastic probe has a diameter of less than 30 µm and does not damage the dielectric surface.文檔
無文檔