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ONTO / RUDOLPH / AUGUST S200
  • ONTO / RUDOLPH / AUGUST S200
  • ONTO / RUDOLPH / AUGUST S200
  • ONTO / RUDOLPH / AUGUST S200
描述
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配置
S200 FX - 4 Chamber
OEM 代工型號說明
The S200 is a metrology system designed by Rudolph to meet the challenges of high-yield semiconductor production at 0.18μm and below. It offers the industry’s highest repeatability laser-ellipsometer and a High Repeatability Mode (HRM™) for next-generation gates. The system has a 5x10μm measurement spot, the smallest in the industry, allowing for accurate measurements in test structures three times smaller than those required by other systems. Its unique simultaneous multiple angle of incidence ellipsometry provides accurate measurements, resulting in powerful multi-layer film characterization and superior process control. The S200 also has a high wafer-per-hour throughput, nearly twice that of competing ellipsometers, and long 20-30,000 hour laser lifetimes provide unparalleled system-to-system matching, superior repeatability, and significantly lower maintenance.
文檔

無文檔

類別
Metrology

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

66632


晶圓尺寸:

未知


年份:

2012


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ONTO / RUDOLPH / AUGUST

S200

verified-listing-icon
已驗證
類別
Metrology
上次驗證: 超過60天前
listing-photo-2932d8a5d49e457ba600000fac7a523a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

66632


晶圓尺寸:

未知


年份:

2012


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
S200 FX - 4 Chamber
OEM 代工型號說明
The S200 is a metrology system designed by Rudolph to meet the challenges of high-yield semiconductor production at 0.18μm and below. It offers the industry’s highest repeatability laser-ellipsometer and a High Repeatability Mode (HRM™) for next-generation gates. The system has a 5x10μm measurement spot, the smallest in the industry, allowing for accurate measurements in test structures three times smaller than those required by other systems. Its unique simultaneous multiple angle of incidence ellipsometry provides accurate measurements, resulting in powerful multi-layer film characterization and superior process control. The S200 also has a high wafer-per-hour throughput, nearly twice that of competing ellipsometers, and long 20-30,000 hour laser lifetimes provide unparalleled system-to-system matching, superior repeatability, and significantly lower maintenance.
文檔

無文檔