描述
無描述配置
無配置OEM 代工型號說明
The Trajectory T³ is a cutting-edge metrology module developed by Nanometrics for monitoring and controlling critical processes in semiconductor fabs worldwide. It has been approved for integration by leading process tool manufacturers and has set new standards for speed, reliability, and cost. With its robust large area optical collectors, simple yet powerful spectral detectors, and a MTBF of over 10,000 hours, the Trajectory T³ minimizes cost while maximizing performance. Capable of processing over 250 wafers per hour, it can measure every process wafer even on the fastest process tools. By enabling process tools to measure thicknesses inside the tool and inside the wafer’s patterned devices, the Trajectory T³ delivers unparalleled advantages in speed, reliability, and cost. It is truly changing the game in integrated metrology.文檔
無文檔
類別
Metrology
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
127160
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / NANOMETRICS / ACCENT / BIO-RAD
TRAJECTORY T3
類別
Metrology
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
127160
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The Trajectory T³ is a cutting-edge metrology module developed by Nanometrics for monitoring and controlling critical processes in semiconductor fabs worldwide. It has been approved for integration by leading process tool manufacturers and has set new standards for speed, reliability, and cost. With its robust large area optical collectors, simple yet powerful spectral detectors, and a MTBF of over 10,000 hours, the Trajectory T³ minimizes cost while maximizing performance. Capable of processing over 250 wafers per hour, it can measure every process wafer even on the fastest process tools. By enabling process tools to measure thicknesses inside the tool and inside the wafer’s patterned devices, the Trajectory T³ delivers unparalleled advantages in speed, reliability, and cost. It is truly changing the game in integrated metrology.文檔
無文檔