描述
無描述配置
無配置OEM 代工型號說明
The VIISta 810 HP provides precise total incident angle and dosimetry control to enable tighter distribution of electrical device parameters and a 50% reduction in contamination to enhance device yields. The generic VIISta platform covers the range of ion implantation energies from 200eV through to 3.75 MeV. For medium current implants in the middle of that range, the VIISta 810 HP provides control of Vt and halo implants, improving the consistency of operating characteristics and yield across the wafer, the company claimed.文檔
無文檔
類別
Medium Current
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
136055
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT) / VARIAN
VIISta 810HP
類別
Medium Current
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
136055
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The VIISta 810 HP provides precise total incident angle and dosimetry control to enable tighter distribution of electrical device parameters and a 50% reduction in contamination to enhance device yields. The generic VIISta platform covers the range of ion implantation energies from 200eV through to 3.75 MeV. For medium current implants in the middle of that range, the VIISta 810 HP provides control of Vt and halo implants, improving the consistency of operating characteristics and yield across the wafer, the company claimed.文檔
無文檔