描述
Status - Installed, power off QUINTEL Q4000 is a soft-etching, contact-based mask aligner. It is designed to enable precise, high-yield lithography processes used for the production of semiconductor devices, MEMS, and other microscale components. It is also used for the production of other nanostructure and nanoscale devices. The machinery is composed of a scanning stage, a mechanical assembly, an optical imaging equipment, and ancillaries. The scanning stage consists of two orthogonal axes of motion, an X-axis and a Y-axis. This allows the mask to be precisely positioned in the optical field-of-view. The mechanical assembly is designed to ensure optimal mechanical tolerances for dimensional accuracy, flatness, and leveling of the masks. This is essential for achieving the highest possible lithographic throughput.配置
無配置OEM 代工型號說明
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QUINTEL
Q 4000
已驗證
類別
Mask/Bond Aligners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
Installed / Down
產品編號:
103539
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
QUINTEL
Q 4000
類別
Mask/Bond Aligners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
Installed / Down
產品編號:
103539
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Status - Installed, power off QUINTEL Q4000 is a soft-etching, contact-based mask aligner. It is designed to enable precise, high-yield lithography processes used for the production of semiconductor devices, MEMS, and other microscale components. It is also used for the production of other nanostructure and nanoscale devices. The machinery is composed of a scanning stage, a mechanical assembly, an optical imaging equipment, and ancillaries. The scanning stage consists of two orthogonal axes of motion, an X-axis and a Y-axis. This allows the mask to be precisely positioned in the optical field-of-view. The mechanical assembly is designed to ensure optimal mechanical tolerances for dimensional accuracy, flatness, and leveling of the masks. This is essential for achieving the highest possible lithographic throughput.配置
無配置OEM 代工型號說明
未提供文檔
無文檔