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AXCELIS OPTIMA MD
  • AXCELIS OPTIMA MD
  • AXCELIS OPTIMA MD
  • AXCELIS OPTIMA MD
  • AXCELIS OPTIMA MD
  • AXCELIS OPTIMA MD
  • AXCELIS OPTIMA MD
  • AXCELIS OPTIMA MD
  • AXCELIS OPTIMA MD
描述
Medium Current Implant
配置
-Software Version: 1.7.0.4.DP14 -CIM: GEM -Process: Implant
OEM 代工型號說明
The Optima MD is the only low energy, mid-dose ion implanter for all channel engineering applications in the low-dose and mid-dose regimes. The single wafer productivity-driven platform covers traditional medium current processes as well as emerging low energy mid-dose HALO implants.
文檔

無文檔

類別
Low Current

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

112994


晶圓尺寸:

12"/300mm


年份:

2006


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AXCELIS

OPTIMA MD

verified-listing-icon
已驗證
類別
Low Current
上次驗證: 超過60天前
listing-photo-d84c2c39251d43c89d2526f319e047f6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/79476/d84c2c39251d43c89d2526f319e047f6/5e2d8de4d9324c639e183525ba261929_9462686bfe4a42fd8b53e4b6e5f86a3f_mw.png
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listing-photo-d84c2c39251d43c89d2526f319e047f6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/79476/d84c2c39251d43c89d2526f319e047f6/c30730679b5a478e9f59021f524bd57c_bdbe695a3dee4873a2ed39d619327cbc_mw.png
listing-photo-d84c2c39251d43c89d2526f319e047f6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/79476/d84c2c39251d43c89d2526f319e047f6/a8ac985d2d274d00823f1254a627fb5a_946135f480e04dd8915fb17d627c3ff945005c_mw.jpeg
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

112994


晶圓尺寸:

12"/300mm


年份:

2006


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Medium Current Implant
配置
-Software Version: 1.7.0.4.DP14 -CIM: GEM -Process: Implant
OEM 代工型號說明
The Optima MD is the only low energy, mid-dose ion implanter for all channel engineering applications in the low-dose and mid-dose regimes. The single wafer productivity-driven platform covers traditional medium current processes as well as emerging low energy mid-dose HALO implants.
文檔

無文檔