描述
High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras配置
無配置OEM 代工型號說明
未提供文檔
無文檔
類別
Lithography
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled
產品編號:
148405
晶圓尺寸:
未知
年份:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
ionLINE Plus
類別
Lithography
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled
產品編號:
148405
晶圓尺寸:
未知
年份:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
High Resolution FIB-SEM, with Lithography capability -Excellent beam spot and low beam tails -FIB nano-fabrication beyond Gallium -Sub-10 nm FIB nano-fabrication -NanoFabrication with ion species beyond Gallium -Rapid, versatile manual operation -Advanced lithographic automated operation -Direct Patterning Ion milling -Exposure of photoresist, maskless ion implanting and hard masking. -Ion beam induced deposition, and gas-assisted etching -Cross-sectioning and sample preparation -Circuit editting and modification -Laser Interferometer stage allows field stitching and continuous write -Cartesian Nanomanipulators allow in-situ probing and Nanoprofiling -It has automated focus control -It is fitted with various optical cameras配置
無配置OEM 代工型號說明
未提供文檔
無文檔