描述

Electron Beam Lithography System

配置

EBPG5150 - Raith EBPG5150 Electron Beam Lithography System. Ultra High Performance e-Beam Writer EBPG5150 includes: - Thermal Field Emission Gun - 50 and 100 kV beam energy calibration - Automatic dynamic off-axis focus, stigmation and distortion correction software - 50 MHz pattern generator, low noise 20-bit main field deflection Upgraded to 125MHz pattern Generator in 2025 - Field size operation, variable, up to 524 um by 524 um at all voltages 155mm by 155mm stage travel - Lambda/1024 (0.6 nm) laser interferometer resolution - 2-holder Airlock with "straight through" loading design - 5" Mask Holder (part B701110, required for system calibration) - Binocular microscope with X/Y stage and Z measurement to pre-align wafers and piece-parts on their holder prior to system loading (part B706208) - System control software suite "BEAMS" on fully integrated control PC running Linux OS with Ethernet interface EBIPG - 100 MHz Pattern Generator - Upgrade to 100 MHz maximum clock speed operation. Low noise 20-bit deflection over the main field. EBIFS - Increased Field Size - Upgrade with Increased Field Size operation. Main field size is variable up to 1048 um by 1048 um maximum, yet single-nanometer beam stepping is still possible at maximum field size. For use will all beam currents and column voltages. Improves system throughput by reducing sheer number of stage movements necessary. Also beneficial in cases where entire device (or most critical parts) can be written within a single field and therefore have no stitch EBTHA - Ten-holder Airlock - Upgrade to automated airlock capable of housing 10 (ten) separate substrate holders. The Ten-holder Airlock has the same "straight through" loading design as the default 2-holder Airlock. EBISS - Increased Stage Speed - Upgrade with Increased Stage Speed. Field-to-field step times are reduced by rough factors of 3 to 5 times the normal step time. EBISS is of particular benefit when working on wafers and masks. The design incorporates active vibration isolation to manage abrupt stage movements. B701128 - 100 mm top reference Wafer Holder (QTY 4) B725220 - Holder Storage Rack - The Holder Storage Rack accommodates up to 20 substrate holders. Holders are delicate and expensive. Keep the investment organized, safe and clean by stowing unused holders in the Storage Rack. The Storage Rack stands on four independently adjustable feet, has a transparent front side, and has provision to flow with Nitrogen or dry air if desired. EBUPS - EBPG Un-interruptible Power Supply - The UPS unit is intended to provide a stable, clean and safe power feed to the EBPG. The autonomy runtime is on the order of many minutes and therefore is not meant to keep the instrument running continuously in the event of complete building failure. The UPS design incorporates an isolation transformer and thus provides a clean power source throughout building power fluctuations, spikes or brownouts. B701230 - Automatic Aperture Changer EBPG-TSCR - Touchscreen Display B700011 - Laser Height Sensor for Alignment Microscope EBENV - Environmental Chamber - Free-standing mini-environments can be used to dampen room temperature instabilities. A chamber reduces demands of the facility control over the conditions of the room. Various technical solutions are possible, but as one example the EBPG can be maintained to + 0.1° C even though the lab room may fluctuate + 1.5° C. The enclosure is typically sized to house the plinth and SAEHT electronics cabinet, but can be large enough to also include the sample mounting station or even the operator control station. PPC - Pattern Preparation Computer - Pattern Preparation software requires a compatible computer platform for system operation. The computer needs to be one that is on the recommendation list. Linux/PC systems are popular, but other options exist (including HP/Unix, SUN/Solaris). The workstation will be fully loaded and setup with Data Prep software and factory demonstrated. EBGEN+TRACER - GenISys BEAMER Full Advanced Data Prep + PEC Package + Monte.Carlo Simulation Software - The EBGEN package is EBLAY and EBGPR combined. - TRACER can calculate proximity correction parameters by Monte Carlo simulation. TRACER also enables more advanced PEC techniques such as shape correction to objects, and 3D correction for multi-layer resist applications, etc. EBFCS - Magnetic Field Cancellation System - Active cancellation system to reduce extraneous EM fields. Necessity of a magnetic field cancellation system can be consulted after performing a thorough environment site survey.

OEM 代工型號說明

Tailored for all direct-write applications, the EBPG5150 is specifically optimized for a 155 mm by 155 mm stage, utilizing the universal plinth platform shared with the EBPG5200. Its versatile design allows for loading different sample sizes and quantities, accommodating anything from individual piece parts to full wafer sizes with ease.