描述
無描述配置
無配置OEM 代工型號說明
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.文檔
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RAITH
150 TWO
類別
Lithography
上次驗證: 18 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
140319
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.文檔
無文檔