描述
-E-beam lithography system w/ SEM -Column was replaced 5 years ago -Has a Scanning Electron Microscope to facilitate imaging and navigation of the sample -Had a service contract until 2 years ago, has been idle for a couple years -Hardware and key components are in good shape -The computer was upgraded配置
SEM inspection and sample navigation * Image resolution: 2.0 nm @ 20 kV 4.0 nm @ 1 kVOEM 代工型號說明
The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.文檔
無文檔
類別
Lithography
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131301
晶圓尺寸:
未知
年份:
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
RAITH
150 E BEAM
類別
Lithography
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131301
晶圓尺寸:
未知
年份:
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
-E-beam lithography system w/ SEM -Column was replaced 5 years ago -Has a Scanning Electron Microscope to facilitate imaging and navigation of the sample -Had a service contract until 2 years ago, has been idle for a couple years -Hardware and key components are in good shape -The computer was upgraded配置
SEM inspection and sample navigation * Image resolution: 2.0 nm @ 20 kV 4.0 nm @ 1 kVOEM 代工型號說明
The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.文檔
無文檔