描述
Stepper配置
無配置OEM 代工型號說明
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)文檔
無文檔
NIKON
FX-601F
已驗證
類別
Lithography
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
61726
晶圓尺寸:
未知
年份:
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
FX-601F
類別
Lithography
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
61726
晶圓尺寸:
未知
年份:
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Stepper配置
無配置OEM 代工型號說明
Resolution: ≦ 2.4 µm (isolated pattern), ≦ 3 µm (L/S) Projection magnification: 1:1.25 Exposure field: 120 mm square to 98.78 (H) × 138 (V) mm (≦ ø169.71 mm) Reticle size: 6-in. (0.25-in. thickness) Maximum plate size: 550 × 650 mm Overlay: ≦ 0.5 µm (EGA, |M| + 3σ)文檔
無文檔