描述
無描述配置
無配置OEM 代工型號說明
Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.文檔
無文檔
類別
Lithography
上次驗證: 18 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
140316
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
JEOL
JBX-6300FS
類別
Lithography
上次驗證: 18 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
140316
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.文檔
無文檔