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6" Fab For Sale from Moov - Click Here to Learn More
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HITACHI HL-7000M
    描述
    E-Beam Litho
    配置
    6" RETICLE MASK LINE
    OEM 代工型號說明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
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    HITACHI

    HL-7000M

    verified-listing-icon

    已驗證

    類別
    Lithography

    上次驗證: 29 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    115224


    晶圓尺寸:

    12"/300mm


    年份:

    2002


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography
    年份: 2002條件: 二手
    上次驗證29 天前

    HITACHI

    HL-7000M

    verified-listing-icon
    已驗證
    類別
    Lithography
    上次驗證: 29 天前
    listing-photo-abc5b9ae0acd44d9a2be3d4843d6062c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    115224


    晶圓尺寸:

    12"/300mm


    年份:

    2002


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    E-Beam Litho
    配置
    6" RETICLE MASK LINE
    OEM 代工型號說明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    文檔

    無文檔

    類似上架商品
    查看全部
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography年份: 2002條件: 二手上次驗證:29 天前
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography年份: 0條件: 二手上次驗證:超過60天前