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HITACHI HL-7000M
    描述
    HL7000M
    配置
    6" RETICLE MASK LINE
    OEM 代工型號說明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
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    HITACHI

    HL-7000M

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    類別

    Lithography
    上次驗證: 超過30天前
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    產品編號:

    100367


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    年份:

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    HITACHI HL-7000M
    HITACHIHL-7000MLithography
    年份: 0條件: 二手
    上次驗證27 天前

    HITACHI

    HL-7000M

    verified-listing-icon

    已驗證

    類別

    Lithography
    上次驗證: 超過30天前
    listing-photo-6b855dc4106e4c4b88adb0aeb8b13e1b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    100367


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    HL7000M
    配置
    6" RETICLE MASK LINE
    OEM 代工型號說明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    文檔

    無文檔

    類似上架商品
    查看全部
    HITACHI HL-7000M
    HITACHI
    HL-7000M
    Lithography年份: 0條件: 二手上次驗證: 27 天前
    HITACHI HL-7000M
    HITACHI
    HL-7000M
    Lithography年份: 0條件: 二手上次驗證: 超過60天前