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HITACHI HL-7000M
    描述
    6" RETICLE MASK LINE
    配置
    無配置
    OEM 代工型號說明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
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    HITACHI

    HL-7000M

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    已驗證

    類別
    Lithography

    上次驗證: 13 天前

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    條件:

    Used


    作業狀態:

    未知


    產品編號:

    101772


    晶圓尺寸:

    未知


    年份:

    未知

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    類似上架商品
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    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography
    年份: 2002條件: 二手
    上次驗證13 天前

    HITACHI

    HL-7000M

    verified-listing-icon
    已驗證
    類別
    Lithography
    上次驗證: 13 天前
    listing-photo-4910996d204141df9ad532d6e0f6f1b9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    101772


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    6" RETICLE MASK LINE
    配置
    無配置
    OEM 代工型號說明
    Hitachi developed the electron beam mask writer HL-7000M for 90nm node reticle production. New technologies, such as a novel electron beam optical column, a 1-nm address grid and improved proximity effect correction are used in the system. It has two electrostatic deflectors, a 50-kV electron gun and a maximum beam size of 2 µm ×2 µm. It can emit up to a current density of 20 A/cm2. The writing strategy uses a variable shaped beam, vector scanning and continuous stage moving exposure. To comply with high volume data, it can accept a hierarchy data format which can effectively be compressed into a small file. The new storage area network (SAN) we adopted achieves high-speed data transfer and does not need a high-volume disc system.
    文檔

    無文檔

    類似上架商品
    查看全部
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography年份: 2002條件: 二手上次驗證: 13 天前
    HITACHI HL-7000M

    HITACHI

    HL-7000M

    Lithography年份: 0條件: 二手上次驗證: 超過60天前