描述
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.配置
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEM 代工型號說明
未提供文檔
無文檔
類別
Lithography
上次驗證: 3 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
145810
晶圓尺寸:
未知
年份:
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HEIDELBERG INSTRUMENTS
DWL 66FS
類別
Lithography
上次驗證: 3 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
145810
晶圓尺寸:
未知
年份:
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Primarily used for writing lithography masks with pre-spun photoresist. Recently replaced the laser interferometer encoder and temperature controller for the environmental chamber Manuals are included for the tool, conversion software, laser encoder, and temperature controller.配置
405nm laser with a 4mm write head Working software both to convert and write on two computers (GDSII was the go-to format, has other file format options, including Grayscale Can handle large substrates up to 9x9" Maximum write field up to 200mmOEM 代工型號說明
未提供文檔
無文檔