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HEIDELBERG INSTRUMENTS DWL 66
    描述
    The Heidelberg Instruments DWL-66 is a versatile laser-based system designed for advanced mask production and wafer patterning. Utilizing a HeCd laser, it achieves fine resolution down to 800 nm through meticulous alignment and control of the laser optics. Fully operational and still installed.
    配置
    442 nm wavelength, 300 mW, HeCd laser (replaced in 2014, has around 4400 hours of usage) 4 mm write head 20 mm write head Flowbox Greyscale exposure Upgraded computer to Windows 7 in 2019 Metrology and Alignment Package
    OEM 代工型號說明
    The DWL 66 is a precise, maskless laser lithography system for various applications like maskless lithography, photomask making, and direct writing. It supports gray-scale exposures on flat, photosensitive-coated materials. Key features include a minimum feature size of 0.6 microns, substrate size up to 200 x 200 mm, and over 1.0M dpi resolution using a 20-nanometer address grid.
    文檔

    無文檔

    類別
    Lithography

    上次驗證: 17 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Running


    產品編號:

    115928


    晶圓尺寸:

    未知


    Laser:
    442

    年份:

    2002


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    HEIDELBERG INSTRUMENTS

    DWL 66

    verified-listing-icon
    已驗證
    類別
    Lithography
    上次驗證: 17 天前
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Running


    產品編號:

    115928


    晶圓尺寸:

    未知


    Laser:
    442

    年份:

    2002


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    The Heidelberg Instruments DWL-66 is a versatile laser-based system designed for advanced mask production and wafer patterning. Utilizing a HeCd laser, it achieves fine resolution down to 800 nm through meticulous alignment and control of the laser optics. Fully operational and still installed.
    配置
    442 nm wavelength, 300 mW, HeCd laser (replaced in 2014, has around 4400 hours of usage) 4 mm write head 20 mm write head Flowbox Greyscale exposure Upgraded computer to Windows 7 in 2019 Metrology and Alignment Package
    OEM 代工型號說明
    The DWL 66 is a precise, maskless laser lithography system for various applications like maskless lithography, photomask making, and direct writing. It supports gray-scale exposures on flat, photosensitive-coated materials. Key features include a minimum feature size of 0.6 microns, substrate size up to 200 x 200 mm, and over 1.0M dpi resolution using a 20-nanometer address grid.
    文檔

    無文檔