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IBS TM200S
    描述
    VCR Group IBS TM200S ion beam sputtering system is useful for SEM and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating device is equipped with a 200 l/s turbo-molecular pump, an ion-beam gun, a quartz crystal thickness monitor, a four-position target carrier, and a liquid nitrogen cold trap.
    配置
    System specifications: Electrical: Interlocked to prevent high voltage shock 110 V AC, 50/ 60 Hz, 15 A 220 V AC, 50/ 60 Hz, 10 A (Optional) Mechanical: Weight: < 500 lbs Size: Approximate overall dimensions 50” H x 24” W x 32” D (chamber lid open) 40” H x 24” W x 32” D (chamber lid closed) Utilities: Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure Nitrogen Gas Flow: Turbomolecular Pump bleed Water Flow: 30 GPH, clean water
    OEM 代工型號說明
    The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).
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    已驗證

    類別
    Ion Beam / IBD

    上次驗證: 10 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    17433


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    IBS TM200S

    IBS

    TM200S

    Ion Beam / IBD
    年份: 0條件: 二手
    上次驗證10 天前

    IBS

    TM200S

    verified-listing-icon
    已驗證
    類別
    Ion Beam / IBD
    上次驗證: 10 天前
    listing-photo-ia0-DPv3YOFB1ylt4Q2igODhJuEmfbjnQZLizxs8PRY-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1875/ia0-DPv3YOFB1ylt4Q2igODhJuEmfbjnQZLizxs8PRY/961a0b3a8be04bf2a595465bef188a9b_0175d03825ec484790898fb3cdcbc39b_f.jpeg
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    17433


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    VCR Group IBS TM200S ion beam sputtering system is useful for SEM and TEM sample preparation. The IBS/TM200 Ion beam sputter-coating device is equipped with a 200 l/s turbo-molecular pump, an ion-beam gun, a quartz crystal thickness monitor, a four-position target carrier, and a liquid nitrogen cold trap.
    配置
    System specifications: Electrical: Interlocked to prevent high voltage shock 110 V AC, 50/ 60 Hz, 15 A 220 V AC, 50/ 60 Hz, 10 A (Optional) Mechanical: Weight: < 500 lbs Size: Approximate overall dimensions 50” H x 24” W x 32” D (chamber lid open) 40” H x 24” W x 32” D (chamber lid closed) Utilities: Argon Gas Flow: 5-10 psi, 1.5 sccm, 99.999 % pure Nitrogen Gas Flow: Turbomolecular Pump bleed Water Flow: 30 GPH, clean water
    OEM 代工型號說明
    The IBS TM200S is an ion beam sputtering system manufactured by VCR Group. It is designed to deposit ultra-fine grain conductive films of metals or carbon onto sample surfaces, making it particularly useful for preparing samples for scanning electron microscopy (SEM) and transmission electron microscopy (TEM).
    文檔

    無文檔

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    查看全部
    IBS TM200S

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    Ion Beam / IBD年份: 0條件: 二手上次驗證:10 天前
    IBS TM200S

    IBS

    TM200S

    Ion Beam / IBD年份: 0條件: 二手上次驗證:超過60天前