描述
無描述配置
Gas module: N2, Ar, BF3, Ar (Walkup Only) Gas box without gas bottle Source area: Dual vaporizer Accelerator: 0.75 Mev column / Remote control for Ar stripper gas Beam filter: 10° Analysis power / 10° Chamber normal Injector: 60 keV Extraction possibility to 50 keV 110° Analysis power supply Process chamber: (9) Site disks (2) Gate valves for cryo pump, 12" Linear actuator assy for tilt scan transducer Wafer handler: (2) Loadlocks Dump loadlock for 6", 8" cast platform RPM: (3) iQDP80 Dry pump for source, ACCEL, chamber iQDP40 Dry pump Missing parts: 1000C Turbo for source (2) 1000 Turbo for ACCEL (2) Cryo pumps, 12" / 8500 Compressor.OEM 代工型號說明
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.文檔
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APPLIED MATERIALS (AMAT) / VARIAN
KESTREL 750
已驗證
類別
High Energy
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
24051
晶圓尺寸:
未知
年份:
未知
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Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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APPLIED MATERIALS (AMAT) / VARIAN
KESTREL 750
已驗證
類別
High Energy
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
24051
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Gas module: N2, Ar, BF3, Ar (Walkup Only) Gas box without gas bottle Source area: Dual vaporizer Accelerator: 0.75 Mev column / Remote control for Ar stripper gas Beam filter: 10° Analysis power / 10° Chamber normal Injector: 60 keV Extraction possibility to 50 keV 110° Analysis power supply Process chamber: (9) Site disks (2) Gate valves for cryo pump, 12" Linear actuator assy for tilt scan transducer Wafer handler: (2) Loadlocks Dump loadlock for 6", 8" cast platform RPM: (3) iQDP80 Dry pump for source, ACCEL, chamber iQDP40 Dry pump Missing parts: 1000C Turbo for source (2) 1000 Turbo for ACCEL (2) Cryo pumps, 12" / 8500 Compressor.OEM 代工型號說明
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.文檔
無文檔
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