跳到主要內容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 閱讀詳情

Moov logo

Moov Icon
APPLIED MATERIALS (AMAT) / VARIAN KESTREL 750
  • APPLIED MATERIALS (AMAT) / VARIAN KESTREL 750
  • APPLIED MATERIALS (AMAT) / VARIAN KESTREL 750
  • APPLIED MATERIALS (AMAT) / VARIAN KESTREL 750
描述
Complete system
配置
Implanter
OEM 代工型號說明
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.
文檔

無文檔

類別
High Current

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

111692


晶圓尺寸:

8"/200mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

APPLIED MATERIALS (AMAT) / VARIAN

KESTREL 750

verified-listing-icon
已驗證
類別
High Current
上次驗證: 超過60天前
listing-photo-573fd8a0bd404c4dbc8edd30725da4e5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

111692


晶圓尺寸:

8"/200mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Complete system
配置
Implanter
OEM 代工型號說明
The Kestrel 750 is a high energy ion implanter that is the industry’s most cost-effective MeV implanter. It operates in the range of 10 - 3750 keV. Varian offers device makers the lowest cost, most practical MeV production solution with its Kestrel high energy implanter. Kestrel has distinct advantages in cost of ownership with its compact design, unique DC Tandetron accelerator, and large implant chamber. The simplicity of the Kestrel design sets this system apart from other MeV implanters and makes it the tool of choice for production MeV implants.
文檔

無文檔