We value your privacy
We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 閱讀詳情
180XP
概述
The Varian 180XP is designed to deliver high-current ion beams for ion implantation processes. It offers precise control over ion beam characteristics, such as energy, dose, and angle of incidence, to enable the creation of precise dopant profiles in the semiconductor material.
活躍中的上架商品
2
服務
檢驗、保險、評估、物流
