描述
無描述配置
無配置OEM 代工型號說明
The SEN Corporation / Sumitomo NV-GSD-HE is a globally recognized high-energy ion implantation system designed for 200mm, 150mm, and 125mm wafers, offering exceptional productivity in the energy range of up to 3 MeV. It supports an energy range between 10 keV and 3,000 keV, providing increased acquisition energy and improved efficiency through RF acceleration using RF resonators. The system features enhanced beam current at high energy levels due to optimized mass analyzing magnet and FEM (Final Energy Magnet). For higher implantation efficiency, it offers the option of installing a CVA (Continuous Variable Aperture). The NV-GSD-HE ensures high accuracy of implantation and maintains high beam quality by minimizing metal contamination and cross-contamination. The optional VSD (Virtual Slit Disk) and TSDF (Triple Surface Disk Faraday) further reduce cross-contamination.文檔
無文檔
類別
High Current
上次驗證: 2 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
153263
晶圓尺寸:
6"/150mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEN CORPORATION / SUMITOMO
NV GSD HE
類別
High Current
上次驗證: 2 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
153263
晶圓尺寸:
6"/150mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The SEN Corporation / Sumitomo NV-GSD-HE is a globally recognized high-energy ion implantation system designed for 200mm, 150mm, and 125mm wafers, offering exceptional productivity in the energy range of up to 3 MeV. It supports an energy range between 10 keV and 3,000 keV, providing increased acquisition energy and improved efficiency through RF acceleration using RF resonators. The system features enhanced beam current at high energy levels due to optimized mass analyzing magnet and FEM (Final Energy Magnet). For higher implantation efficiency, it offers the option of installing a CVA (Continuous Variable Aperture). The NV-GSD-HE ensures high accuracy of implantation and maintains high beam quality by minimizing metal contamination and cross-contamination. The optional VSD (Virtual Slit Disk) and TSDF (Triple Surface Disk Faraday) further reduce cross-contamination.文檔
無文檔