
描述
無描述配置
GSD 200E2 high current 90keV Non-HPES handler SMIF Software: 6.4.4 SECS Missing: LPT2200 Roughing Pump x2 Cryo Pump x2 Disk Chiller Source Turbo PumpOEM 代工型號說明
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.文檔
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GSD 200E2
類別
High Current
上次驗證: 12 天前
關鍵商品詳情
條件:
Used
作業狀態:
Installed / Running
產品編號:
149514
晶圓尺寸:
8"/200mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
GSD 200E2 high current 90keV Non-HPES handler SMIF Software: 6.4.4 SECS Missing: LPT2200 Roughing Pump x2 Cryo Pump x2 Disk Chiller Source Turbo PumpOEM 代工型號說明
The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.文檔
無文檔