描述
無描述配置
無配置OEM 代工型號說明
The Quantum X Plus is a groundbreaking single-wafer, high-current implanter that has set new standards in 65nm production. It offers superior low-energy, high-dose performance, enabling device scaling and delivering exceptional capabilities for Logic and Memory applications. The implanter's fixed beam technology, combined with a precision mechanical scanning system, provides unmatched features such as defect engineering for ultra-shallow junction formation below 45nm and precise angle control for advanced memory structures. When paired with the Applied Vantage RadiancePlus RTP, the Quantum X Plus forms a powerful combination, incorporating cutting-edge co-implantation and defect engineering technology to meet both current and future high-current implantation requirements. Key features of the Quantum X Plus include the highest productivity for ultra-shallow junction formation across a wide energy range, two-dimensional parallel scanning with StepScan for precise angle control and iso-centric scanning for high tilt applications, advanced motion control for optimal crystal defect management, and predictive and managed uniformity for consistent implant results.文檔
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APPLIED MATERIALS (AMAT)
QUANTUM X PLUS
已驗證
類別
High Current
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
32096
晶圓尺寸:
12"/300mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
QUANTUM X PLUS
已驗證
類別
High Current
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
32096
晶圓尺寸:
12"/300mm
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
無配置OEM 代工型號說明
The Quantum X Plus is a groundbreaking single-wafer, high-current implanter that has set new standards in 65nm production. It offers superior low-energy, high-dose performance, enabling device scaling and delivering exceptional capabilities for Logic and Memory applications. The implanter's fixed beam technology, combined with a precision mechanical scanning system, provides unmatched features such as defect engineering for ultra-shallow junction formation below 45nm and precise angle control for advanced memory structures. When paired with the Applied Vantage RadiancePlus RTP, the Quantum X Plus forms a powerful combination, incorporating cutting-edge co-implantation and defect engineering technology to meet both current and future high-current implantation requirements. Key features of the Quantum X Plus include the highest productivity for ultra-shallow junction formation across a wide energy range, two-dimensional parallel scanning with StepScan for precise angle control and iso-centric scanning for high tilt applications, advanced motion control for optimal crystal defect management, and predictive and managed uniformity for consistent implant results.文檔
無文檔