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描述
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)配置
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEM 代工型號說明
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類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
111178
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
MRL
Cyclone 630
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
111178
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) low pressure chemical vapor deposition (LPCVD) tool used for silicon nitride deposition at temperature between 700-850°C with batches of up to 50 wafers (4 to 6”)配置
MRL Cyclone 630 Configured: 4 to 6" Tube 1: LPCVD Silicon Nitride, used for silicon nitride deposition at temperatures between 700-850°C Tube 2: Dry Oxidation at temperatures between 700 -1150°C Tube 3: N/A Tube 4: N/AOEM 代工型號說明
未提供文檔
無文檔