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4 Tubes (2 Atmospheric / 2 LPCVD) Tube 1 - (Atm) Diffusion growth of SiO2 films utilizing either ‘Thermal’ or ‘Wet’ oxidation (up to 1100C) Tube 2 - (Atm) Forming gas anneal (up to 800C) Tube 3 - LPCVD SiO2 deposition at lower temperatures (up to 800C) Tube 4 - LPCVD Si3N4 (up to 800C)OEM 代工型號說明
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EXPERTECH
HTR
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Furnaces / Diffusion
上次驗證: 19 天前
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Used
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產品編號:
103682
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年份:
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EXPERTECH
HTR
類別
Furnaces / Diffusion
上次驗證: 19 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
103682
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
4 Tubes (2 Atmospheric / 2 LPCVD) Tube 1 - (Atm) Diffusion growth of SiO2 films utilizing either ‘Thermal’ or ‘Wet’ oxidation (up to 1100C) Tube 2 - (Atm) Forming gas anneal (up to 800C) Tube 3 - LPCVD SiO2 deposition at lower temperatures (up to 800C) Tube 4 - LPCVD Si3N4 (up to 800C)OEM 代工型號說明
Furnance文檔
無文檔