概述

SONORA is a 300mm batch vertical furnace for logic/foundry and memory applications, as well as 300mm analog/power. SONORA is capable of both atmospheric and low-pressure thermal wafer processing. Atmospheric thermal applications include diffusion and activation of dopants, annealing to affect material properties by heating to a specific temperature, and oxidation to form silicon oxide. LPCVD applications include polysilicon, silicon nitride, and silicon oxide.