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描述
ASM A400 with one standard Power Poly reactor and one Dope Power Poly reactor.配置
ASMi A400 LPCVD Dope PP & LPCVD std PP reactor Heater type: 5 zones Gas panel layout: SiH4 - N2 - Dopand Brooks MFC's Process pressure: 80 ÷ 120 mTorr Process temperature: 620 - 680 °C Genmark MK4 Robot Paddle temprature control PowerPoly specific flanges temp controlled at 80 °C Gas/smoke detection of SiH4OEM 代工型號說明
The ASM AD400 is a diffusion and oxidation furnaces system used in semiconductor manufacturing. It is designed for processing 8-inch wafers with dual tubes or 6-inch wafers with dual boats. The system's body is anodized to resist corrosion, ensuring durability and reliability during wafer processing.文檔
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ASM
A400
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
65295
晶圓尺寸:
未知
年份:
1998
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描述
ASM A400 with one standard Power Poly reactor and one Dope Power Poly reactor.配置
ASMi A400 LPCVD Dope PP & LPCVD std PP reactor Heater type: 5 zones Gas panel layout: SiH4 - N2 - Dopand Brooks MFC's Process pressure: 80 ÷ 120 mTorr Process temperature: 620 - 680 °C Genmark MK4 Robot Paddle temprature control PowerPoly specific flanges temp controlled at 80 °C Gas/smoke detection of SiH4OEM 代工型號說明
The ASM AD400 is a diffusion and oxidation furnaces system used in semiconductor manufacturing. It is designed for processing 8-inch wafers with dual tubes or 6-inch wafers with dual boats. The system's body is anodized to resist corrosion, ensuring durability and reliability during wafer processing.文檔
無文檔