描述
Seller states it was never used in production配置
The uGmni-200E is a Dry Etching System manufactured by ULVAC, Inc., primarily intended for semiconductor production and experiments. It employs an Inductively Super Magnetron (ISM) plasma source and is a cluster-type system.The system is compatible with wafers up to 8 inches in diameter (including 4 and 6-inch). Its structure includes a Transfer Chamber (L0), Cassette Chamber (L1) with SMIF loader, Aligner (L2), and the main Etching Chamber (L3).The L3 Etching Chamber features a Turbo Molecular Pump (TMP) exhaust, optional Electrostatic Chuck (ESC), and sophisticated wafer temperature control via a chiller and Helium (He) gas assistance. Performance specifications guarantee an etching uniformity of $\pm 5\%$ or lower (within wafer) for continuous 8-inch $\text{SiO}_2/\text{Si}$ wafer processing. The system also supports the SECS/GEM communication interfaceOEM 代工型號說明
未提供文檔
類別
Etch/Asher
上次驗證: 10 天前
關鍵商品詳情
條件:
New
作業狀態:
Deinstalled / Uncrated
產品編號:
137506
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULVAC
uGmni-200E
類別
Etch/Asher
上次驗證: 10 天前
關鍵商品詳情
條件:
New
作業狀態:
Deinstalled / Uncrated
產品編號:
137506
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available