跳到主要內容
Moov logo

Moov Icon
LAM RESEARCH CORPORATION 2300 EXELAN
    描述
    無描述
    配置
    Oxide
    OEM 代工型號說明
    The 2300 Exelan is a dielectric etch system introduced in November 2000, designed to process both 200mm and 300mm wafers. It combines Dual Frequency Confined™ (DFC™) plasma technology with state-of-the-art chamber design to provide advanced process performance for copper conductive lines creation, latest generation insulating films, and high aspect ratio applications. It features the industry’s largest dielectric etch portfolio and is capable of meeting the challenges of new materials and reduced geometries at the 130nm technology node and below.
    文檔

    無文檔

    LAM RESEARCH CORPORATION

    2300 EXELAN

    verified-listing-icon

    已驗證

    類別

    Etch/Asher
    上次驗證: 23 天前
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    92340


    晶圓尺寸:

    未知


    年份:

    未知

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    LAM RESEARCH CORPORATION 2300 EXELAN
    LAM RESEARCH CORPORATION2300 EXELANEtch/Asher
    年份: 0條件: 二手
    上次驗證23 天前

    LAM RESEARCH CORPORATION

    2300 EXELAN

    verified-listing-icon

    已驗證

    類別

    Etch/Asher
    上次驗證: 23 天前
    listing-photo-cfa4128a1ddb4d17b26b6a5f028acef6-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    92340


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Oxide
    OEM 代工型號說明
    The 2300 Exelan is a dielectric etch system introduced in November 2000, designed to process both 200mm and 300mm wafers. It combines Dual Frequency Confined™ (DFC™) plasma technology with state-of-the-art chamber design to provide advanced process performance for copper conductive lines creation, latest generation insulating films, and high aspect ratio applications. It features the industry’s largest dielectric etch portfolio and is capable of meeting the challenges of new materials and reduced geometries at the 130nm technology node and below.
    文檔

    無文檔

    類似上架商品
    查看全部
    LAM RESEARCH CORPORATION 2300 EXELAN
    LAM RESEARCH CORPORATION
    2300 EXELAN
    Etch/Asher年份: 0條件: 二手上次驗證: 23 天前
    LAM RESEARCH CORPORATION 2300 EXELAN
    LAM RESEARCH CORPORATION
    2300 EXELAN
    Etch/Asher年份: 0條件: 二手上次驗證: 超過30天前
    LAM RESEARCH CORPORATION 2300 EXELAN
    LAM RESEARCH CORPORATION
    2300 EXELAN
    Etch/Asher年份: 2004條件: 翻新的上次驗證: 超過60天前