描述
26M06配置
無配置OEM 代工型號說明
Introducing the PE 2061 S Reactor: A field-proven epitaxial wafer production solution, specially designed for severe applications like PowerMos, Discrete, IGBT, and special devices up to 250 microns per 200 Ohm x cm. With its compact barrel design, atmospheric and reduced pressure process capabilities, and one-pass gas flow low frequency inductive heating, it's the top choice for leading semiconductor manufacturers worldwide. Experience efficient wafer handling in a class 10 environment, accommodating 4'', 5'', 6'', and 8'' wafers. Optimize your Clean Room space with its through the wall mounting configuration.文檔
無文檔
LPE
2061S
類別
Epitaxial deposition (EPI)
上次驗證: 6 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
150056
晶圓尺寸:
6"/150mm
年份:
2002
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
26M06配置
無配置OEM 代工型號說明
Introducing the PE 2061 S Reactor: A field-proven epitaxial wafer production solution, specially designed for severe applications like PowerMos, Discrete, IGBT, and special devices up to 250 microns per 200 Ohm x cm. With its compact barrel design, atmospheric and reduced pressure process capabilities, and one-pass gas flow low frequency inductive heating, it's the top choice for leading semiconductor manufacturers worldwide. Experience efficient wafer handling in a class 10 environment, accommodating 4'', 5'', 6'', and 8'' wafers. Optimize your Clean Room space with its through the wall mounting configuration.文檔
無文檔