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ASM EPSILON E2000
    描述
    No warranty
    配置
    無配置
    OEM 代工型號說明
    The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.
    文檔

    ASM

    EPSILON E2000

    verified-listing-icon

    已驗證

    類別
    Epitaxial deposition (EPI)

    上次驗證: 超過30天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Running


    產品編號:

    113487


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
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    ASM EPSILON E2000

    ASM

    EPSILON E2000

    Epitaxial deposition (EPI)
    年份: 0條件: 二手
    上次驗證16 天前

    ASM

    EPSILON E2000

    verified-listing-icon
    已驗證
    類別
    Epitaxial deposition (EPI)
    上次驗證: 超過30天前
    listing-photo-548b773d98d8459ab9e552ef7e8ea657-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/74669/548b773d98d8459ab9e552ef7e8ea657/1eb1847f31a94b75ab775a1d2fe6c3f9_17_mw.jpg
    listing-photo-548b773d98d8459ab9e552ef7e8ea657-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/74669/548b773d98d8459ab9e552ef7e8ea657/607d968068294b4b8837ef6cbcf92859_12_mw.jpg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Running


    產品編號:

    113487


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    No warranty
    配置
    無配置
    OEM 代工型號說明
    The ASM Epsilon E2000 is a single-wafer epitaxy tool designed to accommodate various epitaxy applications. It covers a wide range of processes, including high-temperature silicon for wafer preparation and low-temperature selective or non-selective Silicon Germanium (SiGe) for creating transistor strain layers. The system is optimized for processing 150mm and 200mm wafers, offering flexibility and precision in epitaxial growth processes.
    文檔
    類似上架商品
    查看全部
    ASM EPSILON E2000

    ASM

    EPSILON E2000

    Epitaxial deposition (EPI)年份: 0條件: 二手上次驗證:16 天前
    ASM EPSILON E2000

    ASM

    EPSILON E2000

    Epitaxial deposition (EPI)年份: 0條件: 翻新的上次驗證:超過60天前
    ASM EPSILON E2000

    ASM

    EPSILON E2000

    Epitaxial deposition (EPI)年份: 0條件: 翻新的上次驗證:超過60天前