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描述
無描述配置
300mm Reduced Pressure Decontaminated Uncrated, Covered Upper/Lower lamp modules included Pyrometers included Rotation not includedOEM 代工型號說明
The Centura EPI is a state-of-the-art system that offers the advantages of single-wafer, multi-chamber design for epi deposition. This advanced system provides high throughput, lower cost of ownership benefits, and advanced robotics. The Centura EPI has recently undergone productivity enhancements, including the new AccuSETT remote system for accurate stepper enhanced thickness and In-Line Metrology for integrated FTIR in the cooldown chamber. These enhancements make the Centura EPI an even more powerful tool for epi deposition.文檔
無文檔
類別
Epitaxial deposition (EPI)
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
113190
晶圓尺寸:
12"/300mm
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA EPI
類別
Epitaxial deposition (EPI)
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
113190
晶圓尺寸:
12"/300mm
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
300mm Reduced Pressure Decontaminated Uncrated, Covered Upper/Lower lamp modules included Pyrometers included Rotation not includedOEM 代工型號說明
The Centura EPI is a state-of-the-art system that offers the advantages of single-wafer, multi-chamber design for epi deposition. This advanced system provides high throughput, lower cost of ownership benefits, and advanced robotics. The Centura EPI has recently undergone productivity enhancements, including the new AccuSETT remote system for accurate stepper enhanced thickness and In-Line Metrology for integrated FTIR in the cooldown chamber. These enhancements make the Centura EPI an even more powerful tool for epi deposition.文檔
無文檔