
描述
Description Qty MAIN FRAME 1 69*48*53配置
PROGRESS TYPE: METROLOGY COMPONENT : MAINFRAME STAND MONITOROEM 代工型號說明
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.文檔
無文檔
類別
Elipsometry
上次驗證: 8 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
127796
晶圓尺寸:
8"/200mm
年份:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部ONTO / RUDOLPH / AUGUST
FOCUS FE VII
類別
Elipsometry
上次驗證: 8 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
127796
晶圓尺寸:
8"/200mm
年份:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Description Qty MAIN FRAME 1 69*48*53配置
PROGRESS TYPE: METROLOGY COMPONENT : MAINFRAME STAND MONITOROEM 代工型號說明
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.文檔
無文檔