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APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310
    描述
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    OEM 代工型號說明
    The Raider™ ECD310 is a fourth-generation, single-wafer, automated, multi-process electrochemical deposition tool. It delivers advanced metal processing in a small footprint and is available with cluster modules for metrology, plating, and cleaning. The Raider™ ECD310 incorporates programmable reactors that provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to deliver advanced metal processing capabilities in a compact package.
    文檔

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

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    已驗證

    類別

    Electro Plating
    上次驗證: 7 天前
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    97404


    晶圓尺寸:

    未知


    年份:

    未知

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    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310
    APPLIED MATERIALS (AMAT) / SEMITOOLRAIDER ECD310Electro Plating
    年份: 0條件: 二手
    上次驗證超過60天前

    APPLIED MATERIALS (AMAT) / SEMITOOL

    RAIDER ECD310

    verified-listing-icon

    已驗證

    類別

    Electro Plating
    上次驗證: 7 天前
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    97404


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The Raider™ ECD310 is a fourth-generation, single-wafer, automated, multi-process electrochemical deposition tool. It delivers advanced metal processing in a small footprint and is available with cluster modules for metrology, plating, and cleaning. The Raider™ ECD310 incorporates programmable reactors that provide an ECD seed layer, a full solution for copper fill with uniformity and film characteristics, and integrated removal of all backside, bevel, and edge copper contamination and seed layer edge exclusion etch. Additionally, in-situ anneal is available. This tool is designed to deliver advanced metal processing capabilities in a compact package.
    文檔
    類似上架商品
    查看全部
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310
    APPLIED MATERIALS (AMAT) / SEMITOOL
    RAIDER ECD310
    Electro Plating年份: 0條件: 二手上次驗證: 超過60天前
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310
    APPLIED MATERIALS (AMAT) / SEMITOOL
    RAIDER ECD310
    Electro Plating年份: 0條件: 二手上次驗證: 超過60天前
    APPLIED MATERIALS (AMAT) / SEMITOOL RAIDER ECD310
    APPLIED MATERIALS (AMAT) / SEMITOOL
    RAIDER ECD310
    Electro Plating年份: 0條件: 二手上次驗證: 超過60天前