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TEL / TOKYO ELECTRON UNITY ME
    描述
    Oxide
    配置
    Oxide
    OEM 代工型號說明
    UNITY™ Me is a cost effective dry etch system for 100/150/200mm wafer diameter, which has been attracting attention in recent years again as a highly efficient system and is still sold as a new product. There are rich variety of special chamber specifications, such as SCCM™, DRM for SiO2/SiN etch and UD chamber for Si/SiC trench etch. TEL offers a wide range of etch applications to the customer through closely collaboration in process demonstration using internal evaluation tools. Unity ME was originally made in Mass. But moved to Japan, supported 3 chambers and an ash or other small unit. Originally 200mm, some were converted to 300mm. TEL now manufactures this system again for 100-300mm.
    文檔

    無文檔

    TEL / TOKYO ELECTRON

    UNITY ME

    verified-listing-icon

    已驗證

    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    56168


    晶圓尺寸:

    8"/200mm


    年份:

    2004


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON UNITY ME

    TEL / TOKYO ELECTRON

    UNITY ME

    Dry / Plasma Etch
    年份: 2001條件: 二手
    上次驗證超過60天前

    TEL / TOKYO ELECTRON

    UNITY ME

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-319ba7a3d9d647b0ba068f6adb5d5eac-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    56168


    晶圓尺寸:

    8"/200mm


    年份:

    2004


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Oxide
    配置
    Oxide
    OEM 代工型號說明
    UNITY™ Me is a cost effective dry etch system for 100/150/200mm wafer diameter, which has been attracting attention in recent years again as a highly efficient system and is still sold as a new product. There are rich variety of special chamber specifications, such as SCCM™, DRM for SiO2/SiN etch and UD chamber for Si/SiC trench etch. TEL offers a wide range of etch applications to the customer through closely collaboration in process demonstration using internal evaluation tools. Unity ME was originally made in Mass. But moved to Japan, supported 3 chambers and an ash or other small unit. Originally 200mm, some were converted to 300mm. TEL now manufactures this system again for 100-300mm.
    文檔

    無文檔

    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON UNITY ME

    TEL / TOKYO ELECTRON

    UNITY ME

    Dry / Plasma Etch年份: 2001條件: 二手上次驗證:超過60天前
    TEL / TOKYO ELECTRON UNITY ME

    TEL / TOKYO ELECTRON

    UNITY ME

    Dry / Plasma Etch年份: 2004條件: 二手上次驗證:超過60天前