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描述
Transfer Module 3 x DRM - 200mm chambers AC rack - Turbo controller Seiko Seiki - ENI generators V2 ECC Rack SMC Chillers 2ea & controller AC box 1) Mainframe + AC box 2) DRM chamber #1 3) DRM chamber #2 + DRM chamber #3 4) RF rack with ENI Generators / Seiko Seiki turbo controllers 5) Cables / water lines, ETC Missing parts: 1 EPD Sensor配置
TEL Unity M 8555DDDOEM 代工型號說明
The UNITY® is a plasma etch system that delivers world-class process results on a wide range of applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It is designed to achieve excellent cost performance for the 130nm design rule and future technology generations. The UNITY® has various platforms, including the IIe, M, and Me, each designed to achieve higher productivity and reliability for specific applications. The UNITY® M model features high throughput, a compact design, and lower CoO (Cost of Ownership), as well as ease of maintenance. The UNITY® Me model includes a Flow Control System. The UNITY® IIe is available in 84, 85, and 88 models and features PE (IIe), IEM (IIe), DRM, and SCCM™ chambers.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled / Palletized
產品編號:
81929
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
UNITY M
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled / Palletized
產品編號:
81929
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Transfer Module 3 x DRM - 200mm chambers AC rack - Turbo controller Seiko Seiki - ENI generators V2 ECC Rack SMC Chillers 2ea & controller AC box 1) Mainframe + AC box 2) DRM chamber #1 3) DRM chamber #2 + DRM chamber #3 4) RF rack with ENI Generators / Seiko Seiki turbo controllers 5) Cables / water lines, ETC Missing parts: 1 EPD Sensor配置
TEL Unity M 8555DDDOEM 代工型號說明
The UNITY® is a plasma etch system that delivers world-class process results on a wide range of applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It is designed to achieve excellent cost performance for the 130nm design rule and future technology generations. The UNITY® has various platforms, including the IIe, M, and Me, each designed to achieve higher productivity and reliability for specific applications. The UNITY® M model features high throughput, a compact design, and lower CoO (Cost of Ownership), as well as ease of maintenance. The UNITY® Me model includes a Flow Control System. The UNITY® IIe is available in 84, 85, and 88 models and features PE (IIe), IEM (IIe), DRM, and SCCM™ chambers.文檔
無文檔