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TEL / TOKYO ELECTRON UNITY IIE 85DD
    描述
    VIA ETCH
    配置
    無配置
    OEM 代工型號說明
    The UNITY® IIe is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, including IIe, M, and Me, which were designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe 85 delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is known for its high throughput, compact design, and lower CoO. Additionally, it offers ease of maintenance and a Flow Control System (Me). The UNITY® IIe is available in 84, 85 and 88 models.
    文檔

    無文檔

    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    127946


    晶圓尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    TEL / TOKYO ELECTRON

    UNITY IIE 85DD

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-1641c88cef044ed09dc78983f3bbbbf2-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    127946


    晶圓尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    VIA ETCH
    配置
    無配置
    OEM 代工型號說明
    The UNITY® IIe is a plasma etch system designed to achieve excellent cost performance for the 130nm design rule and future technology generations. It is one of the various platforms of the UNITY® series, including IIe, M, and Me, which were designed to achieve higher productivity and reliability for specific applications. The UNITY® IIe 85 delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch. It features PE (IIe), IEM (IIe), DRM and SCCM chambers, and is known for its high throughput, compact design, and lower CoO. Additionally, it offers ease of maintenance and a Flow Control System (Me). The UNITY® IIe is available in 84, 85 and 88 models.
    文檔

    無文檔